Download Advances in CMP Polishing Technologies by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa PDF

By Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa

ISBN-10: 1437778593

ISBN-13: 9781437778595

CMP and sharpening are the main specified methods used to complete the surfaces of mechanical and digital or semiconductor parts. Advances in CMP/Polishing applied sciences for Manufacture of digital units offers the most recent advancements and technological concepts within the box – making state-of-the-art R&D obtainable to the broader engineering group.

Most of the purposes of those tactics are saved as private as attainable (proprietary information), and particular info aren't visible in expert or technical journals and magazines. This publication makes those approaches and functions obtainable to a much broader business and educational audience.

Building at the basics of tribology – the technology of friction, put on and lubrication – the authors discover the sensible purposes of CMP and sprucing throughout numerous industry sectors. because of the excessive velocity of improvement of the electronics and semiconductors undefined, some of the provided strategies and purposes come from those industries.

  • Demystifies medical advancements and technological concepts, commencing them up for brand new functions and method advancements within the semiconductor and different components of precision engineering
  • Explores inventory removing mechanisms in CMP and sprucing, and the demanding situations interested by predicting the results of abrasive techniques in high-precision environments
  • The authors collect the newest options and study from the united states and Japan

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Sample text

Lapping was used for polishing and finishing optical lenses in the late sixteenth century, such as were used in Galileo’s telescope. With the emergence of precision optical instruments in the late nineteenth century, such as binoculars and range finders, powered lapping machines were used extensively in optical shops throughout Europe and the USA. Since there was no significant requirement for producing quantities of metallic components with excellent finishes and tolerances, lapping was not used in the metal working industry.

These oxidation-induced stacking faults (OSF) on the back side of the silicon wafer can getter any metal impurities located on the top of a silicon wafer of 800 mm thickness. During the slicing of silicon ingots into wafers with wire saws, mechanical damage is left on the silicon surface. This saw damage is more pronounced than the damage produced by silicon slurry blasting. Consequently, the saw damage is expected to induce micro-cracks and or a strained layer in the silicon crystal lattice. It would be interesting to determine the possibility of utilizing the defects created by saw damage as gettering sources in the silicon crystal.

Two sides of a work piece can be lapped in the time required to machine one side. 2. A large number of work pieces can be lapped simultaneously. 3. Magnetic as well as non-magnetic parts can be lapped. 4. It can machine any kind of stable material from plastic to diamond. 29 Vertical travel of top lapping plate 5. Double-sided lapping is the best available method to obtain close tolerances for flatness, parallelism and size. 6. The stock is removed from both sides of the work piece simultaneously, which helps to relieve internal stresses, thus achieving flatness.

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